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 Block Copolymer at Nano-Patterned Surfaces


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We present numerical calculations of lamellar phases of block copolymers at patterned surfaces. We model symmetric di-block copolymer films forming lamellar phases and the effect of geometrical and chemical surface patterning on the alignment and orientation of lamellar phases. The calculations are done within self-consistent field theory (SCFT), w

Autor: Xingkun Man; David Andelman; Henri Orland

Fuente: https://archive.org/







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