Magnetic-Field Induced Strains in Ferromagnetic Shape Memory Alloy Ni55Mn23Ga22 Deposited by RF-Magnetron SputteringReportar como inadecuado




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Published in: PLASMA PROCESSES AND POLYMERS, vol. 6, num. S1, p. S822-S825 Publication date: 2009

1.5mm–Ni55Mn23Ga22 ferromagnetic thin films were deposited onto silicon substrates and silicon single beam cantilever using radio-frequency magnetron sputtering. As-deposited sample and heat-treated thin films were studied on their silicon substrates and peeled off to determine the influence of the stress. Post-heat treatment process allows at the films to achieve the shape memory effect (SME). Vibrating sample magnetometer (VSM) and deflection measurement of the sample annealed at 873 K during 36 ks exhibit ferromagnetic martensitic structure with a typical SME response to the magnetic field induced strains which match the values of the bulk material.

Reference CIME-ARTICLE-2009-028doi:10.1002/ppap.200932104





Autor: Bernard, F; Rousselot, C; Delobelle, P; Hirsinger, L; Burdet, P

Fuente: https://infoscience.epfl.ch/record/142311?ln=en







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