Generation of Porous Alumina Layers in a Polydimethylsiloxane-Hydrogen Peroxide Medium on Aluminum Substrate in Corona DischargesReportar como inadecuado




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Journal of Nanomaterials - Volume 2014 2014, Article ID 578720, 6 pages -

Research Article

National Institute of Lasers, Plasma and Radiation Physics, Magurele, 077125 Bucharest, Romania

National Institute for Materials Physics, Magurele, 077125 Bucharest, Romania

Received 2 July 2014; Accepted 1 August 2014; Published 3 September 2014

Academic Editor: Daniela Predoi

Copyright © 2014 A. Groza et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

The porous alumina Al2O3 layer obtained at the interface between polydimethylsiloxane-hydrogen peroxide medium and aluminum substrate under charged and neutral species injection produced in negative corona discharges in air at atmospheric pressure is analyzed by different methods in this paper. The scanning electron microscopy investigations showed the uniform distribution of the pores formed in the alumina layer and their columnar structures. Both energy dispersive X-ray spectroscopy EDS and X-ray photoelectron spectroscopy XPS measurements indicate that during the anodization process of the aluminum in the polydimethylsiloxane-hydrogen peroxide medium in corona discharge the incorporation of silicon in the structure of the alumina layer is possible.





Autor: A. Groza, A. Surmeian, C. Diplasu, C. Luculescu, C. Negrila, and M. Ganciu

Fuente: https://www.hindawi.com/



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