SURFACE CONDITIONING EFFECT ON VACUUM MICROELECTRONICS COMPONENTS FABRICATED BY DEEP REACTIVE ION ETCHINGReportar como inadecuado




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1 ESYCOM - Electronique, Systèmes de communication et Microsystèmes 2 THALES Airborne Systems Elancourt

Abstract : Advances in material processing such as silicon micromachining are opening the way to vacuum microelectronics. Two-dimensional vacuum components can be fabricated using the microsystems processes. We developed such devices using a single metal layer and silicon micromachining by DRIE. The latter technological step has significant impact on the characteristics of the vacuum components. This paper presents a brief summary of electron emission possibilities and the design leading to the fabrication of a lateral field emission diode. First measurement results and the aging of the devices are also discussed.

Keywords : Field Emission Micromachining Surface Conditioning DRIE





Autor: A. Phommahaxay - G. Lissorgues - L. Rousseau - T. Bourouina - P. Nicole -

Fuente: https://hal.archives-ouvertes.fr/



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