Internal Friction of SiO21-x GeO2x GlassesReportar como inadecuado




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Abstract : Internal friction of SiO21-x GeO2x glasses x = 0, 5, 10, 24 and 100 mole% is measured at temperatures between 1.6 and 280 K. The data are filted with the equations for thermally activated relaxation with distributing activation energies in symmetrical double-well potentials. From the determined relaxation strength spectra for each sample, the contributions from each type of microscopic structural units are calculated assuming that transverse motion of the bridging O atom in Si-O-Si, Si-O-Ge or Ge-O-Ge bridge T model is the microscopic unit responsible for relaxation. For instance, the magnitude of internal friction for SiO2-5% GeO2 or 24% GeO2 is calculated from the data of pure SiO2, SiO2-10% GeO2 and pure GeO2. The calculated results agree well with the measurements of SiO2-5% GeO2 and SiO2-24% GeO2. Thus T model is shown to be quantitalively consistent with internal friction of SiO2-GeO2 binary glasses.





Autor: T. Kosugi H. Kobayashi Y. Kogure

Fuente: https://hal.archives-ouvertes.fr/



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