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Abstract : In this paper, we report the study of the magnetic properties of Li0.5-x-2 Mn0.1ZnxFe2.35-x-2O4 films with x=0, 0.16, 0.32, 0.48. The films were deposited on fused quartz substrates by rf sputteriug technique under various deposition conditions. The magnetic properties of the films annealed at 750°C are being reported. The Ma values of the films deposited at a rf power of 240 W in argon atmosphere were found to be smaller than the corresponding bulk values. The Ma value was found to be maximum at x=0.32, similar to the bulk. The Hc values of the films are much higher than the bulk values and decrease as a function of x.





Autor: J. Dash N. Venkataramani R. Krishnan S. Date S. Kulkarni S. Prasad S. Shringi P. Kishan N. Kumar

Fuente: https://hal.archives-ouvertes.fr/



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