Area-selective ALD of titanium dioxide using lithographically defined poly methyl methacrylate filmsReportar como inadecuado


Area-selective ALD of titanium dioxide using lithographically defined poly methyl methacrylate films


Area-selective ALD of titanium dioxide using lithographically defined poly methyl methacrylate films - Descarga este documento en PDF. Documentación en PDF para descargar gratis. Disponible también para leer online.

An approach to area-selective atomic layer deposition techniques based on the use of a lithographically definable polymeric masking layer has been reported. Successful direct patterned deposition of TiO2 is demonstrated using a poly methyl methacrylate masking layer that has been patterned using deep-UV lithography. A number of factors which must be considered in designing patternable polymeric masking materials and processes have been determined and are briefly discussed, including reactivity of the polymer with the atomic layer deposited ALD precursor species, diffusion of ALD precursors through the polymer mask, and remnant precursor content in the masking film during ALD cycling.



COPE Publications -



Autor: Sinha, A. - Hess, Dennis W. - Henderson, Clifford L. - -

Fuente: https://smartech.gatech.edu/







Documentos relacionados