A simple method for measurement of photoacid generator photoreaction kinetics in formulated, chemically amplified photoresist filmsReportar como inadecuado


A simple method for measurement of photoacid generator photoreaction kinetics in formulated, chemically amplified photoresist films


A simple method for measurement of photoacid generator photoreaction kinetics in formulated, chemically amplified photoresist films - Descarga este documento en PDF. Documentación en PDF para descargar gratis. Disponible también para leer online.

A method which utilizes experimental measurement and modeling of photoacid-catalyzed deprotection rates obtained via Fourier transform infrared spectroscopy has been developed for determining photoacid generator PAG photoreaction rate constants i.e., Dill C parameters in protected polymer matrices. Numerical modeling of deprotection rates as a function of exposure dose and postexposure bake time is used to determine the Dill C parameters for the PAG in the actual resist matrix polymer of interest. This protocol is shown to be a fast, nondestructive, and material-saving technique that can permit measurement of Dill C parameters in reactive polymer matrixes.



COPE Publications -



Autor: Lee, Cheng-Tsung - Yueh, Wang - Roberts, Jeanette - Henderson, Clifford L. - -

Fuente: https://smartech.gatech.edu/







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