Influence of Temperature on Diamond Films Deposited on WC-Co Substrates by DC-PCVDReport as inadecuate




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The DC plasma chemical vapor deposition DC-PCVD method was a promising technique to fabricate CVD diamond coatings in industry, where it was imperative to minimize the price of synthetic diamond. Diamond films were synthesized on a cemented carbide YG6 substrate using the gaseous mixtures of methane and hydrogen by DC-PCVD. The grow texture, surface morphologies and qualities of as-deposited samples were characterized by X-ray diffractometer XRD, scanning election microscopy SEM and Raman spectra methods respectively. The experimental results showed that with the increase of deposition temperature, the grain size of diamond film grow up, while the content of grain boundaries decreased, and the diamond phase purity was enhanced. The residual stress in the film was competitive, and also increases with deposition temperature. Rockwell indention test indicated that the diamond film synthesize at 840℃ showed good adhesive with cemented carbide substrate.

KEYWORDS

diamond film; DC-PCVD; Tungsten carbide; adhesion

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Author: Long-cheng Yin, Hai-liang Huang, Xian-yang He, Dan Wang, Hong-yan Peng, Yu-qiang Chen1

Source: http://www.scirp.org/



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