H2O2 Based Oxidation Processes for the Treatment of Real High Strength Aqueous WastesReportar como inadecuado


H2O2 Based Oxidation Processes for the Treatment of Real High Strength Aqueous Wastes


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1

Department of Civil Engineering and Architecture, University of Pavia, via Ferrata 1, 27100 Pavia, Italy

2

Department of Mechanical and Industrial Engineering, University of Brescia, via Branze 38, 25123 Brescia, Italy

3

Department of Civil, Environmental, Architectural Engineering and Mathematics, University of Brescia, via Branze 43, 25123 Brescia, Italy





*

Author to whom correspondence should be addressed.



Academic Editor: Marco Ragazzi

Abstract This work was aimed at studying the applicability of H2O2-based oxidation processes namely H2O2-UV, photo-Fenton, and Fenton for the treatment of six real aqueous wastes. These wastes derived from chemical, pharmaceutical, and detergent production, and were characterised by high COD chemical oxygen demand and, in four cases, surfactant concentrations: overall, about 100 tests were conducted. The H2O2-UV and photo-Fenton processes proved to be very effective in COD removal, the efficiency being greater than 70%. The optimal treatment conditions for the H2O2-UV process were: 120 min reaction, H2O2-CODinitial dosage ratio = 1-2; the radiation intensity up to 2000 W·L−1 revealed to be a crucial factor, especially in the earlier stage of the process about 40 min: this aspect can be exploited to reduce the costs related to energy consumption. For the photo-Fenton process the following conditions were chosen: Fe2+-H2O2 ratio = 1-30; specific power input = 125 W·L−1; H2O2-CODinitial = 1-2; reaction time = 240 min. Photolytic reactions and the presence of dissolved oxygen revealed to be crucial factors for COD removal. The Fenton process, while showing a moderate efficiency 25% COD removal in the treatment of high loaded wastewaters, provided excellent results in the treatment of aqueous wastes with high content of surfactants. An average yield removal of 70% for non-ionic surfactants TAS and 95% for anionic surfactants MBAS was obtained, under the following optimal conditions: Fe2+-H2O2 = 1-4, H2O2-CODinitial ratio = 1, and contact time = 30 min. View Full-Text

Keywords: advanced oxidation processes; Fenton; H2O2-UV; hydroxyl radical; photo-Fenton; surfactants advanced oxidation processes; Fenton; H2O2-UV; hydroxyl radical; photo-Fenton; surfactants





Autor: Maria Cristina Collivignarelli 1, Roberta Pedrazzani 2, Sabrina Sorlini 3, Alessandro Abbà 1,* and Giorgio Bertanza 3

Fuente: http://mdpi.com/



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