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Electronic and Computer Engineering Department, University of Limerick, Plassey Technological Park, Limerick, Ireland





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Abstract Thick films Nickel oxide NiO in the form of pn-junctions and planar structures with interdigitated electrodes were investigated for γ-radiation dosimetry purposes. Samples were fabricated using the thick film screen-printing technique. All devices were exposed to a disc-type 137Cs source with an activity of 370 kBq. They showed an increase in the values of current with the increase in radiation dose up to a certain level. Performance parameters of the devices, such as sensitivity to γ-radiation exposure and working dose region, were found to be highly dependant on the composition of the materials used.

Keywords: Nickel Oxide; Thick Films; Gamma Radiation; Pn-junction; Interdigitated Electrodes Nickel Oxide; Thick Films; Gamma Radiation; Pn-junction; Interdigitated Electrodes





Autor: Khalil Arshak * , Olga Korostynska and Farah Fahim

Fuente: http://mdpi.com/



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