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1

Department of Chemistry, Faculty of Science, Masaryk University, Kotlarska 2, CZ-611 37 Brno, Czech Republic

2

Department of Chemistry and Biochemistry, Mendel University of Agriculture and Forestry, Zemedelska 1, CZ-613 00 Brno, Czech Republic

3

Department of Animal Nutrition and Forage Production, Faculty of Agronomy, Mendel University of Agriculture and Forestry, Zemedelska 1, CZ-613 00 Brno, Czech Republic

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Department of Microelectronics, Faculty of Electrical Engineering and Communication, Brno University of Technology, Udolni 53, CZ-602 00 Brno, Czech Republic

5

Department of Natural Drugs, Faculty of Pharmacy, University of Veterinary and Pharmaceutical Sciences, Palackeho 1-3, CZ-612 42 Brno, Czech Republic





*

Author to whom correspondence should be addressed.



Abstract Chloride ion sensing is important in many fields such as clinical diagnosis, environmental monitoring and industrial applications. We have measured chloride ions at a carbon paste electrode CPE and at a CPE modified with solid AgNO3, a solution of AgNO3 and-or solid silver particles. Detection limits 3 S-N for chloride ions were 100 μM, 100 μM and 10 μM for solid AgNO3, solution of AgNO3 and-or solid silver particles, respectively. The CPE modified with silver particles is the most sensitive to the presence chloride ions. After that we approached to the miniaturization of the whole electrochemical instrument. Measurements were carried out on miniaturized instrument consisting of a potentiostat with dimensions 35 × 166 × 125 mm, screen printed electrodes, a peristaltic pump and a PC with control software. Under the most suitable experimental conditions Britton-Robinson buffer, pH 1.8 and working electrode potential 550 mV we estimated the limit of detection 3 S-N as 500 nM. View Full-Text

Keywords: Chloride Ions; Silver; Carbon Paste Electrode; Screen Printed Electrode; Voltammetry; Amperometry Chloride Ions; Silver; Carbon Paste Electrode; Screen Printed Electrode; Voltammetry; Amperometry





Autor: Libuse Trnkova 1, Vojtech Adam 2,3, Jaromir Hubalek 4, Petr Babula 5 and Rene Kizek 1,*

Fuente: http://mdpi.com/



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