Manufacture of Micromirror Arrays Using a CMOS-MEMS TechniqueReport as inadecuate




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1

Department of Mechanical Engineering, National Chung Hsing University, Taichung, 402 Taiwan

2

Department of Electro-Optical Engineering, Yuan Ze University, Taoyuan, 320 Taiwan

3

Department of Mechanical and Electro-Mechanical Engineering, Tamkang University, Tamsui, 251 Taiwan





*

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Abstract In this study we used the commercial 0.35 µm CMOS complementary metal oxide semiconductor process and simple maskless post-processing to fabricate an array of micromirrors exhibiting high natural frequency. The micromirrors were manufactured from aluminum; the sacrificial layer was silicon dioxide. Because we fabricated the micromirror arrays using the standard CMOS process, they have the potential to be integrated with circuitry on a chip. For post-processing we used an etchant to remove the sacrificial layer and thereby suspend the micromirrors. The micromirror array contained a circular membrane and four fixed beams set symmetrically around and below the circular mirror; these four fan-shaped electrodes controlled the tilting of the micromirror. A MEMS microelectromechanical system motion analysis system and a confocal 3D-surface topography were used to characterize the properties and configuration of the micromirror array. Each micromirror could be rotated in four independent directions. Experimentally, we found that the micromirror had a tilting angle of about 2.55° when applying a driving voltage of 40 V. The natural frequency of the micromirrors was 59.1 kHz. View Full-Text

Keywords: micromirror array; microactuator; CMOS-MEMS micromirror array; microactuator; CMOS-MEMS





Author: Pin-Hsu Kao 1, Ching-Liang Dai 1,* , Cheng-Chih Hsu 2 and Chyan-Chyi Wu 3

Source: http://mdpi.com/



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