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Department of Mechanical Engineering, National Chung Hsing University, Taichung, 402 Taiwan


Department of Electro-Optical Engineering, Yuan Ze University, Taoyuan, 320 Taiwan


Department of Mechanical and Electro-Mechanical Engineering, Tamkang University, Tamsui, 251 Taiwan


Author to whom correspondence should be addressed.

Abstract In this study we used the commercial 0.35 µm CMOS complementary metal oxide semiconductor process and simple maskless post-processing to fabricate an array of micromirrors exhibiting high natural frequency. The micromirrors were manufactured from aluminum; the sacrificial layer was silicon dioxide. Because we fabricated the micromirror arrays using the standard CMOS process, they have the potential to be integrated with circuitry on a chip. For post-processing we used an etchant to remove the sacrificial layer and thereby suspend the micromirrors. The micromirror array contained a circular membrane and four fixed beams set symmetrically around and below the circular mirror; these four fan-shaped electrodes controlled the tilting of the micromirror. A MEMS microelectromechanical system motion analysis system and a confocal 3D-surface topography were used to characterize the properties and configuration of the micromirror array. Each micromirror could be rotated in four independent directions. Experimentally, we found that the micromirror had a tilting angle of about 2.55° when applying a driving voltage of 40 V. The natural frequency of the micromirrors was 59.1 kHz. View Full-Text

Keywords: micromirror array; microactuator; CMOS-MEMS micromirror array; microactuator; CMOS-MEMS

Author: Pin-Hsu Kao 1, Ching-Liang Dai 1,* , Cheng-Chih Hsu 2 and Chyan-Chyi Wu 3



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