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Microsystems Laboratory LMIS4, École Polytechnique Fédérale de Lausanne EPFL, Station 17, 1015 Lausanne, Switzerland





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Note: In lieu of an abstract, this is an excerpt from the first page.

Excerpt In 1997, the first paper using SU-8 as a material for microfabrication was published 1, demonstrating the interest of this negative photoresist for the near-UV structuration of thick layers and the manufacturing of high aspect-ratio components



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Autor: Arnaud Bertsch * and Philippe Renaud

Fuente: http://mdpi.com/



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