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Abstract: Constant flux atom deposition into a porous medium is shown to generate adense overlayer and a diffusion profile. Scaling analysis shows that theoverlayer acts as a dynamic control for atomic diffusion in the poroussubstrate. This is modeled by generalizing the porous diffusion equation with atime-dependent diffusion coefficient equivalent to a nonlinear rescaling oftime



Autor: Pascal Brault, Christophe Josserand, Jean-Marc Bauchire, Amael Caillard, Christine Charles, Rod W. Boswell

Fuente: https://arxiv.org/







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