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Journal of NanomaterialsVolume 2010 2010, Article ID 148596, 4 pages

Research Article

School of Materials Science and Engineering, Zhengzhou University, Zhengzhou 450001, China

Materials Physics Laboratory of Education Ministry of China, Zhengzhou University, Zhengzhou 450052, China

Department of Engineering Mechanics, Zhengzhou University, Zhengzhou 450001, China

Received 31 May 2010; Accepted 21 June 2010

Academic Editor: Rakesh Joshi

Copyright © 2010 Zhanling Lu et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

The graphene aggregates films were fabricated directly on Fe-Cr-Ni alloy substrates by microwave plasma chemical vapor deposition system MPCVD. The source gas was a mixture of and with flow rates of 100 sccm and 12 sccm, respectively. The micro- and nanostructures of the samples were characterized by Raman scattering spectroscopy, field emission scanning electron microscopy SEM, and transparent electron microscopy TEM. The field emission properties of the films were measured using a diode structure in a vacuum chamber. The turn-on field was about 1.0 V- m. The current density of 2.1 mA- at electric field of 2.4 V- m was obtained.





Autor: Zhanling Lu, Wanjie Wang, Xiaotian Ma, Ning Yao, Lan Zhang, and Binglin Zhang

Fuente: https://www.hindawi.com/



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