Raman Spectroscopy of Amorphous Carbon Prepared by Pulsed Arc Discharge in Various Gas MixturesReport as inadecuate

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Journal of SpectroscopyVolume 2013 2013, Article ID 467079, 6 pages

Research Article

FEI, STU in Bratislava, Ilkovičova 3, 841 04 Bratislava, Slovakia

Department of Technologies and Materials, FME TU of Košice, Mäsiarska 74, 040 01 Košice, Slovakia

Center for Micro- and Nanotechnologies, TU Ilmenau, Gustav-Kirchhoff-Straße 7, 98693 Ilmenau, Germany

Received 28 June 2012; Revised 22 October 2012; Accepted 23 October 2012

Academic Editor: Roberto Flammini

Copyright © 2013 M. Marton et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


To meet various application requirements, it is important to enable an improvement of a-C structure and properties, such as hardness, adhesion, and wear resistance. In this study, we used the Raman spectroscopy to investigate the a-C thin films structure dependence on the different deposition parameters. The effect of nitrogen, argon, and hydrogen gas flow rate was analyzed to determine the influence on the film properties. The change in the gas type, combination, and flow had a significant influence on the D and G bands of the a-C Raman spectra. The addition of N2 into the chamber promoted the sp

creation, while with adding hydrogen the layer contained more sp

bonds. The depositions of a-C thin films were carried out in pulsed arc discharge vacuum installation. Micro-Raman measurements of the deposited materials were performed using an ISA Dilor-Jobin Yvon-Spex Labram confocal system with 632.8 nm radiation from a He-Ne laser using a back-scattering geometry.

Author: M. Marton, M. Vojs, E. Zdravecká, M. Himmerlich, T. Haensel, S. Krischok, M. Kotlár, P. Michniak, M. Veselý, and R. Re

Source: https://www.hindawi.com/


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