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Plasma etching-Mathematical models., Semiconductors-Etching.

Schoenborn, Philippe.

Supervisor and department:

Examining committee member and department:

Department: Department of Electrical Engineering

Specialization:

Date accepted: 1987

Graduation date:

Degree: Master of Science

Degree level: Master's

Abstract:

Language: English

DOI: doi:10.7939-R3MC8RR9K

Rights: Permission is hereby granted to the University of Alberta Libraries to reproduce single copies of this thesis and to lend or sell such copies for private, scholarly or scientific research purposes only. The author reserves all other publication and other rights in association with the copyright in the thesis and, except as herein before provided, neither the thesis nor any substantial portion thereof may be printed or otherwise reproduced in any material form whatsoever without the author's prior written permission.





Autor: Schoenborn, Philippe.

Fuente: https://era.library.ualberta.ca/



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