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Reference: Astell-Burt, P. J., (1987). Studies on etching and polymer deposition in halocarbon plasmas. DPhil. University of Oxford.Citable link to this page:


Studies on etching and polymer deposition in halocarbon plasmas

Abstract: Plasma etching, the selective removal ofmaterials by reaction with chemically active speciesformed in a glow-discharge, is widely used by theelectronics industry because of the advantages over'wet' processes. The full potential has yet to berealised because chemical processes occuring in theplasma and at the plasma/substrate interface areincompletely understood. In this work attention wasfocussed on the accumulation of polymers on surfacesduring plasma etching in fluorocarbon gases.An apparatus was designed and constructed toexplore the conditions which give rise to thesedeposits by:i) The detection of the excited species suchas CF and CF2 (by optical emission spectroscopy);andii) The rate of accumulation or removal ofdeposits (by means of a quartz crystalmicrobalance).The gases CF4, C2F6, C3F8 and CHF3 were used atpressures between 200-600mT, together with mixtureswith H2 and a few runs with other gases to vary thepartial pressures of etching and polymerizingspecies. Both substrate effect of, viz silicon andthermally oxidised silicon (SiO2), and electrodematerials effects have been examined.Polymer production from C3F8 has been found to bemore sensitive to electrode composition than thatfrom CHF3, but the material formed is overall lessthermally stable. On the other hand, polymersproduced from C3F8 accumulate at similar rates on Siand SiO2, whereas those from CHF3 show a muchgreater liklihood of building up on Si than SiO2 .XPS and infra-red spectroscopy have been used todemonstrate that polymers arising from these twogases exhibit marked structural differences, whichcan be minimised by mixing H2 with C3F8. Theseeffects can be correlated with the decompositionproducts expected in the plasma.

Type of Award:DPhil Level of Award:Doctoral Awarding Institution: University of Oxford Notes:This thesis was digitised thanks to the generosity of Dr Leonard Polonsky


Cheetham, A. K.More by this contributor



Dr. A. K. CheethamMore by this contributor


 Bibliographic Details

Issue Date: 1987Identifiers

Urn: uuid:d8fd1069-a66b-4372-8ba0-b9ca5367445c

Source identifier: 602830147 Item Description

Type: Thesis;

Language: eng Subjects: Halocarbons Etching Plasma etching Tiny URL: td:602830147


Autor: Astell-Burt, P. J. - institutionUniversity of Oxford facultyMathematical and Physical Sciences Division - - - - Contributors Chee



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