en fr Initial stages of metal oxides thin films growth by MOCVD: physicochemical characterisation of the film-substrate interface Les premiers instants de la croissance de films minces doxydes métalliques par MOCVD : caractériReportar como inadecuado




en fr Initial stages of metal oxides thin films growth by MOCVD: physicochemical characterisation of the film-substrate interface Les premiers instants de la croissance de films minces doxydes métalliques par MOCVD : caractéri - Descarga este documento en PDF. Documentación en PDF para descargar gratis. Disponible también para leer online.

1 LRRS - Laboratoire de Recherche sur la Réactivité des Solides

Abstract : The initial stages of Metalorganic Chemical Vapour Deposition MOCVD of TiO2 thin films on Si100 were studied in situ by surface analyses XPS, ARXPS, AES. An original experimental set-up was built for this purpose and developed. Information obtained from these in situ experiments was completed by ex situ characterisations HRTEM, SIMS, GIXRD



The formation of an interfacial SiOy



Autor: Aude Brevet -

Fuente: https://hal.archives-ouvertes.fr/



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